Atomic-Scale Imprinting by Sputter Deposition of Amorphous Metallic Films
Atomic-Scale Imprinting by Sputter Deposition of Amorphous Metallic Films
复制标题
非晶金属薄膜溅射沉积的原子级压印
DOI：
10.1021/acsami.0c14982
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发表时间：
2020
影响因子：
9.5
通讯作者：
Schwarz, Udo D.
中科院分区：
文献类型：
--
作者：
Chen, Zheng;Datye, Amit;Simon, Georg H.;Zhou, Chao;Kube, Sebastian A.;Liu, Naijia;Liu, Jingbei;Schroers, Jan;Schwarz, Udo D.
纳米印迹以其易于实现、低成本、高产量和优异的特征复制精度，被用于制造电气、光学和生物应用的结构或改变表面特性。如果需要超精密和/或亚纳米尺寸的图案，纳米压印在聚合物、二氧化硅玻璃或晶体材料方面只显示出有限的成功。相反，由于没有影响压印分辨率的固有长度尺度，大块金属玻璃(BMG)可以通过热塑性成形(TPF)复制原子尺度的结构。然而，只有少数形成BMG的合金可以用于基于TPF的原子尺度压印。在这里，我们展示了一种基于溅射沉积的替代方法，用于复制原子尺度的特征，适用于非常广泛的非晶态合金，从而极大地扩展了可用的化学成分。该方法的其他优点是可伸缩性、可复制多种模具的能力、低材料消耗以及薄膜可方便地涂覆到几乎任何工件上，这些都为原子定义的表面结构和功能化开辟了新的途径。我们的方法构成了从概念证明到原子尺度印记的实用和高度通用的工具箱的进步，为原子尺度印记的科学和技术提供了探索。
With its ease of implementation, low cost, high throughput, and excellent feature replication accuracy, nanoimprinting is used to fabricate structures for electrical, optical, and biological applications or to modify surface properties. If ultraprecise and/or subnanometer-sized patterns are desired, nanoimprinting has shown only limited success with polymers, silica glasses, or crystalline materials. In contrast, the absence of an intrinsic length scale that would interfere with imprinting resolution enables bulk metallic glasses (BMGs) to replicate structures down to the atomic scale through thermoplastic forming (TPF). However, only a small number of BMG-forming alloys can be used for TPF-based atomic-scale imprinting. Here, we demonstrate an alternative sputter deposition-based approach for the replication of atomic-scale features that is suited for a very broad range of amorphous alloys, thereby dramatically extending the available chemistries. Additional advantages are the method’s scalability, its ability to replicate a wide range of molds, its low material consumption, and the fact that the films can readily be applied onto almost any workpiece, which together open up new avenues to atomically defined surface structuring and functionalization. Our method constitutes the advancement from proof of concept to a practical and highly versatile toolbox of atomic-scale imprinting to be explored for the science and technology of atomic-scale imprinting.