The Focused Ion Beam Instrument
The Focused Ion Beam Instrument
复制标题
聚焦离子束仪器
DOI:
10.1007/0-387-23313-x_1
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发表时间:
2005
期刊:
影响因子:
--
通讯作者:
B. Prenitzer
中科院分区:
文献类型:
--
作者:
F. Stevie;L. Giannuzzi;B. Prenitzer
The typical focused ion beam (FIB) instrument consists of a vacuum system, liquid metal ion source, ion column, stage, detectors, gas inlets, and computer. The liquid metal ion source provides the finely focused ion beam that makes possible high lateral resolution removal of material. Five axis motorized eucentric stage motion allows rapid sputtering at various angles to the specimen. The ion beam interaction with organo-metallic species facilitates site specific deposition of metallic or insulating species. Other gases may be used for enhanced etching of materials. The combination of a scanning electron microscope column and a FIB column forms a dual platform system that provides enhanced capabilities.