XPS study of silicon spheres as a density standard
XPS study of silicon spheres as a density standard
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DOI：
10.1002/sia.6594
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发表时间：
2018-12
影响因子：
1.7
通讯作者：
Lulu Zhang;N. Kuramoto;A. Kurokawa;K. Fujii
中科院分区：
文献类型：
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作者：
Lulu Zhang;N. Kuramoto;A. Kurokawa;K. Fujii
由于密度是材料的基本物理性质之一，一个准确的密度标准是绝对必要的。为了高精度地测定密度，日本国家计量研究所使用了两个1千克重的单晶硅球（NMIJ‐S4和NMIJ‐S5）作为主要标准。为了准确测量硅球的质量和体积，必须仔细考虑表面层的影响。在这项工作中，提出了NMIJ - S4和NMIJ - S5的表面层模型，并使用X射线光电子能谱测定了每个表面层的厚度。提出了详细的不确定度预算，以帮助使用密度标准。
As density is one of the basic physical properties of materials, an accurate density standard is absolutely essential. To determine density with high accuracy and precision, two 1‐kg single‐crystal silicon spheres (NMIJ‐S4 and NMIJ‐S5) are used as the primary standard at the National Metrology Institute of Japan. For the accurate measurement of the mass and volume of the silicon spheres, the effects of the surface layer must be carefully considered. In this work, a surface layer model of NMIJ‐S4 and NMIJ‐S5 was proposed and the thicknesses of each surface layer were determined using X‐ray photoelectron spectroscopy. A detailed uncertainty budget is presented to aid use of the density standard.