Photoemission spectra from conduction bands and core levels of sputter-deposited tantalum films
Photoemission spectra from conduction bands and core levels of sputter-deposited tantalum films
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溅射沉积钽薄膜的导带和核心能级的光电发射光谱
DOI：
10.1103/physrevb.14.4407
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发表时间：
1974
影响因子：
3.7
通讯作者：
C. M. Penchina
中科院分区：
文献类型：
--
作者：
C. M. Penchina
用单色化铝X射线源（Al K. cap alpha../ sub 1//sub，//sub 2/：1486.6eV）和氦紫外共振灯（He I：21.2eV，和He II：40.8eV）。X射线光电子能谱（XPS）被用来确定导带中的电子态密度、芯能级结合能、自旋轨道分裂以及由于表面污染而引起的化学位移。使用分辨率更高的紫外光电子能谱（UPS）来提高费米能级附近导带态密度的分辨率并确定功函数。UPS数据也用于精确校准XPS能量。与钨的类似实验的比较表明，导带是符合刚性带模型。（AIP）
Photoemission spectra of tantalum films, deposited by dc sputtering onto a room-temperature substrate, were obtained using a monochromatized aluminum x-ray source (Al K..cap alpha../sub 1//sub ,//sub 2/: 1486.6 eV) and a helium uv resonance lamp (He I: 21.2 eV, and He II: 40.8 eV). The x-ray photoemission spectra (XPS) were used to determine the density of electron states in the conduction band, the core-level binding energies, the spin-orbit splitting, and the chemical shift due to surface contamination. The much higher resolution ultraviolet photoemission spectra (UPS) were used to improve resolution of the conduction-band density of states near the Fermi level and to determine the work function. UPS data were also used to precisely calibrate the XPS energies. Comparison with similar experiments on tungsten indicate that the conduction bands are consistent with a rigid-band model. (AIP)