K. Nishiguchi, S. Hara, T. Amano, S. Hatatani and S. Ode: "Preparation of Nanocrystalline Silicon Quantum Dots by Pulsed Plasma Processes with High Deposition Rates"Materials Research Society Symposium Proceedings. 571. 43-48 (2000)
K. Nishiguchi, S. Hara, T. Amano, S. Hatatani and S. Ode: "Preparation of Nanocrystalline Silicon Quantum Dots by Pulsed Plasma Processes with High Deposition Rates"Materials Research Society Symposium Proceedings. 571. 43-48 (2000)
复制标题
K. Nishiguchi、S. Hara、T. Amano、S. Hatatani 和 S. Ode:“通过高沉积速率的脉冲等离子体工艺制备纳米晶硅量子点”材料研究学会研讨会论文集。
DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
中科院分区:
文献类型:
--
作者: