Large surface profile measurement with instantaneous phase-shifting interferometry
Large surface profile measurement with instantaneous phase-shifting interferometry
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DOI：
10.1117/1.1532331
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发表时间：
2003-02-01
影响因子：
1.3
通讯作者：
Ngoi, BKA
中科院分区：
文献类型：
--
作者：
Sivakumar, NR;Hui, WK;Ngoi, BKA
光滑表面的表面轮廓测量是当今许多行业的重要领域，特别是在晶圆制造中。高速、高精度、高重复性的非接触式在线测量的需求日益增长，这在实际应用中具有重要意义。在这项工作中，修改迈克尔逊干涉仪结合瞬时相移干涉法提出了高速大平面轮廓。实验在图案化的晶片表面上进行。使用该系统获得的结果进行了比较，与商业轮廓系统，以证明该原则的有效性。(C)2003年，由光学仪器工程师学会（Society of Photo-Optical Instrumentation Engineers）主办。
Surface profile measurement of smooth surfaces is a vital area in many of today's industries, especially in wafer fabrication. The increased need for high-speed, noncontact online measurement with high accuracy and repeatability is of great interest for practical purposes. In this work, a modification of Michelson interferometers in combination with instantaneous phase-shifting interferometry is proposed for highspeed large flat-surface profiling. Experiments are carried out on a patterned wafer surface. The results obtained using this system are compared with a commercial profiler system to demonstrate the validity of the principle. (C) 2003 Society of Photo-Optical Instrumentation Engineers.