Digital and Gradient Refractive Index Planar Optics by Nanoimprinting Mesoporous Silicon (Advanced Optical Materials 24/2022)
Digital and Gradient Refractive Index Planar Optics by Nanoimprinting Mesoporous Silicon (Advanced Optical Materials 24/2022)
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通过纳米压印介孔硅实现数字梯度折射率平面光学（先进光学材料 24/2022）
DOI：
10.1002/adom.202270095
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发表时间：
2022
影响因子：
9
通讯作者：
Ryckman, Judson D.
中科院分区：
文献类型：
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作者：
Hardison, Anna L.;Talukdar, Tahmid H.;Kravchenko, Ivan I.;Ryckman, Judson D.
纳米结构高折射率材料提供了一种强大的手段来定制用于平板光学、超材料、集成光子学、[3-5]和变换光学的平面光学元件的光学特性。[6，7]对于许多平面光学器件，从衍射元件[8]和金属透镜[9-11]到光学斗篷，[7]基于波导的器件，[3，4，12，13]等等，理想的设计方案是设计介电元件之间的亚波长间隔，或者换句话说，构造亚波长光栅(SWG)亚波长亚光栅元。
Nanostructured high refractive index materials offer a powerful means for tailoring the optical characteristics of planar optical components used in flat-optics,[1] metamaterials,[2] integrated photonics,[3–5] and transformation optics.[6, 7] For many planar optical devices ranging from diffractive elements [8] and metalenses,[9–11] to optical cloaks,[7] waveguide-based devices,[3, 4, 12, 13] and more, an ideal design solution is to engineer a sub-wavelength spacing between the dielectric elements, or in other words to construct a sub-wavelength grating (SWG) metama-