Properties of a submicrometer x‐ray beam at the exit of a waveguide
Properties of a submicrometer x‐ray beam at the exit of a waveguide
复制标题
波导出口处亚微米 X 射线束的特性
DOI：
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发表时间：
1996
期刊：
影响因子：
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通讯作者：
C. Riekel
中科院分区：
文献类型：
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作者：
W. Jark;S. Fonzo;S. Lagomarsino;A. Cedola;E. Fabrizio;A. Bram;C. Riekel
本报告讨论了从波导射出的 13 keV 亚微米 X 射线束的特性。这种光谱范围的波导可以通过在高吸收金属之间封装低吸收材料来构建。引导层厚度约为 0.1 μm 时性能最佳。将介绍靠近出口处的光子束尺寸和远离出口处的强度分布的测量结果。从这些数据可以得出出口处的光束尺寸，该尺寸与引导层厚度相同。这个数字在亚微米范围内，为硬 X 射线范围内的显微镜实验提供了有趣的视角。
This report discusses the properties of a 13‐keV submicrometer x‐ray beam exiting from a waveguide. Waveguides for this spectral regime can be constructed by enclosing a low‐absorbing material between highly absorbant metals. Best performance is found for about 0.1 μm guiding layer thickness. Measurements of the photon beam size close to the exit and of the intensity distribution far from the exit will be presented. From these data one derives a beam size at the exit which is identical to the guiding layer thickness. This number being in the submicrometer range offers interesting perspectives for microscopy experiments in the hard x‐ray range.