Configurational anisotropy in nanomagnets
Configurational anisotropy in nanomagnets
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DOI：
10.1103/physrevlett.81.5414
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发表时间：
1998-12-14
影响因子：
8.6
通讯作者：
Welland, ME
中科院分区：
文献类型：
--
作者：
Cowburn, RP;Adeyeye, AO;Welland, ME
采用一种新颖的磁光方法探测了用电子束光刻法制备的150 × 150 × 15 nm(3)方形Ni80Fe14Mo5（“supermalloy”）纳米磁体的内部磁能面。发现了一个强的四重对称各向异性场，强度为365 +/- 20 Oe，这证实了最近关于由于磁化强度与均匀状态的小偏差而出现构型各向异性的预测。
A novel magneto-optical method has been used to probe the internal magnetic energy surface in 150 x 150 x 15 nm(3) square Ni80Fe14Mo5 ("supermalloy") nanomagnets which were fabricated by electron beam lithography. A strong fourfold symmetric anisotropy field of strength 365 +/- 20 Oe is found, which confirms a recent prediction of the appearance of a configurational anisotropy due to the small deviations of the magnetization from the uniform state.