Characterization of a slot antenna microwave plasma source for hydrogen plasma cleaning

Characterization of a slot antenna microwave plasma source for hydrogen plasma cleaning
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DOI:
10.1116/1.579523
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发表时间:
1995-07
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
通讯作者:
D. Korzec;F. Werner;A. Brockhaus;J. Engemann;T. Schneider;R. Nemanich
D. Korzec;F. Werner;A. Brockhaus;J. Engemann;T. Schneider;R. Nemanich
中科院分区:
其他
文献类型:
--
作者:
D. Korzec;F. Werner;A. Brockhaus;J. Engemann;T. Schneider;R. Nemanich

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一种新的大容量微波等离子体源已用于产生氢等离子体。该源由一个环形波导腔组成,其内侧带有轴向槽,充当场施加器以维持 2.45 GHz 的等离子体。等离子体容纳在直径 16 厘米、高 20 厘米的熔融石英钟罩中。槽之间的距离对应于波导波长。该源能够产生高度解离(高达 90%)的氢等离子体以用于清洁目的。等离子源在0.1-1.3 mbar的压力范围和600-2000 W的功率范围内稳定运行。等离子体可以在整个检查的压力范围内点燃,放电点燃所需的功率低于1.7 kW。 0.7 mbar 压力下的最小点火功率为 1050 W。使用双朗缪尔探针和光学发射光谱来表征氢等离子体随微波功率、压力和位置的变化。结果表明,典型的...
A new large volume microwave plasma source has been used for the production of a hydrogen plasma. The source consists of an annular waveguide cavity with axial slots on the inner side which acts as a field applicator to sustain a plasma at 2.45 GHz. The plasma is contained in a fused silica bell jar of 16 cm in diameter and 20 cm in height. The distance between the slots corresponds to a waveguide wavelength. The source is able to generate a highly dissociated (up to 90%) hydrogen plasma for cleaning purposes. Stable operation of the plasma source is shown for a pressure range of 0.1–1.3 mbar and a power range of 600–2000 W. The plasma can be ignited over the entire examined pressure range, and the power needed for discharge ignition is below 1.7 kW. The minimum ignition power is 1050 W for a pressure of 0.7 mbar. A double Langmuir probe and optical emission spectroscopy were used to characterize the hydrogen plasma as a function of microwave power, pressure, and position. The results indicated a typical ...