Single-pass wireframe rendering
Single-pass wireframe rendering
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DOI：
10.1145/1179849.1180035
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发表时间：
2006-07
期刊：
影响因子：
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通讯作者：
J. A. Bærentzen;S. Nielsen;Mikkel Gjøl;Bent Dalgaard Larsen;Niels Jørgen Christensen
中科院分区：
文献类型：
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作者：
J. A. Bærentzen;S. Nielsen;Mikkel Gjøl;Bent Dalgaard Larsen;Niels Jørgen Christensen
深度偏移是必需的，因为栅格化线的过程与栅格化多边形的过程不完全相同。因此，当将多边形边缘光栅化为线时，给定片段可具有与对应多边形本身被光栅化时不同的深度值。这导致点刻伪影。但是，添加偏移量并不是理想的解决方案，因为此偏移量可能会导致本应隐藏的线脱离遮挡。此外，通常在网格中的陡坡附近的任何情况下都存在点画，其中有时需要非常大的偏移。唯一的真实的修复是一个依赖于斜率的偏移，但这往往会使解遮挡问题变得更糟。一些作者已经提出了改进的技术，但要么这些都不是为了现代图形硬件[王等人]。或者它们会导致性能下降[Herrel等人]。
The depth offset is required because the procedure for rasterizing lines is not exactly the same as the one for rasterizing polygons. Consequently, when rasterizing a polygon edge as a line, a given fragment may have a depth value that is different from when the corresponding polygon itself is rasterized. This leads to stippling artefacts. However, adding an offset is not an ideal solution since this offset can result in disocclusions of lines that should be hidden. Moreover, there is usually stippling in any case near steep slopes in the mesh where a very large offset is sometimes required. The only real fix is a slope dependent offset but that tends to make disocclusion problems much worse. A few authors have proposed improved techniques, but either these are not intended for modern graphics hardware [Wang et al.] or they incur a performance hit [Herrel et al.].