Quantifying distortions in soft lithography
Quantifying distortions in soft lithography
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DOI：
10.1116/1.589841
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发表时间：
1998-01-01
影响因子：
1.4
通讯作者：
Whitesides, GM
中科院分区：
文献类型：
--
作者：
Rogers, JA;Paul, KE;Whitesides, GM
This article describes a moire technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than I mu m over areas similar to 1 cm(2). We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility. (C) 1998 American Vacuum Society.
