Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite
Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite
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DOI：
10.1021/nn305639z
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发表时间：
2013-03-01
期刊：
影响因子：
17.1
通讯作者：
Martinson, Alex B. F.
中科院分区：
文献类型：
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作者：
Riha, Shannon C.;Klahr, Benjamin M.;Martinson, Alex B. F.
赤铁矿光阳极通过原子层沉积（AID）涂覆有钴氧化物层。最佳涂层-1 ALD循环，其相当于
Hematite photoanodes were coated with an ultrathin cobalt oxide layer by atomic layer deposition (AID). The optimal coating-1 ALD cycle, which amounts to