Thermal stability, microstructure and mechanical properties of Ti1-xZrxN thin films
Thermal stability, microstructure and mechanical properties of Ti1-xZrxN thin films
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DOI：
10.1016/j.tsf.2007.12.133
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发表时间：
2008-07-31
期刊：
影响因子：
2.1
通讯作者：
Hultman, L.
中科院分区：
文献类型：
--
作者：
Hoerling, A.;Sjolen, J.;Hultman, L.
采用阴极电弧等离子体沉积法制备了单相[NaCl]结构的Ti_（1-x）Zr_xN（0 < x < 1）薄膜。利用X射线衍射（XRD），透射电子显微镜，差示扫描量热法（DSC），和纳米压痕的薄膜进行了研究。用密度泛函理论计算了TiN-ZrN赝二元系的相稳定性，结果表明，该体系存在一个能隙，能隙范围超过0
Single-phase [NaCl]-structure Ti1-xZrxN thin films (0 < x < 1) have been deposited using cathodic arc plasma deposition. The films were investigated using X-ray diffraction (XRD), transmission electron microscopy, differential scanning calorimetry (DSC), and nanoindentation. Density functional theory calculations on phase stabilities show that the pseudo-binary TiN-ZrN system exhibits a miscibility gap, extending over 0