Electron density profile measurement using an ultrashort-pulsed radar reflectometer on large helical device
Electron density profile measurement using an ultrashort-pulsed radar reflectometer on large helical device
复制标题
在大型螺旋装置上使用超短脉冲雷达反射计进行电子密度分布测量
DOI：
10.1063/1.1790071
复制
发表时间：
2004
影响因子：
1.6
通讯作者：
Y. Nagayama
中科院分区：
文献类型：
--
作者：
T. Kaneba;T. Tokuzawa;K. Kawahata;Yasuhiko Ito;Y. Nagayama
我们在大型螺旋装置上安装了一个六通道超短脉冲雷达反射计系统，并进行了电子密度剖面测量。采用飞行时间测量技术测量等离子体中各截止层反射脉冲的延迟时间，以避免辐射效应和杂散反射的混合影响。利用阿贝尔反演法，从延迟时间随探测频率的变化曲线重构了电子密度分布。将重建的密度剖面与远红外干涉仪测得的密度剖面进行了比较。发现每个反射脉冲的到达时间与FIR干涉仪测量的估计时间不同。
We have installed a six channel ultrashort-pulsed radar reflectometer system on the large helical device and performed electron density profile measurements. The delay time of the reflected pulses from each cutoff layer in the plasma is measured by a time-of-flight measurement technique in order to avoid the mixture of radiation effects and spurious reflections. The electron density profile is reconstructed using an Abel inversion method from the profile of the delay time as a function of the probing frequency. The reconstructed density profile is compared with the profile measured with the far-infrared (FIR) interferometer. It is found that the arrival time of each reflected pulse differs from the estimated time measured with the FIR interferometer.