Carbon Contamination in Synchrotron-Radiation-Stimulated Al Deposition Using a Low Temperature Condensed Layer of Dimethyl Aluminum Hydride
Carbon Contamination in Synchrotron-Radiation-Stimulated Al Deposition Using a Low Temperature Condensed Layer of Dimethyl Aluminum Hydride
复制标题
使用二甲基氢化铝低温凝结层的同步辐射刺激铝沉积中的碳污染
DOI:
10.1143/jjap.35.6588
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发表时间:
1996
影响因子:
1.5
通讯作者:
Toshio Ibuki Toshio Ibuki
中科院分区:
文献类型:
--
作者:
Y. Imaizumi;Y. Tsusaka;Tsuneo Urisu Tsuneo Urisu;Toshio Ibuki Toshio Ibuki
The carbon contamination in photochemically deposited Al films fabricated using non-monochromatized synchrotron radiation (SR) and Mg Kα line (1253.6 eV) irradiation were compared by X-ray photoelectron spectroscopy (XPS) analysis. The excitation energy dependence of the carbon contamination, especially the effects of core electron excitations, in the photo-CVD of Al using a low-temperature condensed layer of dimethyl aluminum hydride was determined using XPS spectra and gas-phase photo absorption cross section spectra. A significant decrease of the carbon contaminations was observed in the films fabricated using SR irradiation, which can excite Al 2s and Al 2p core electrons as well as the valence electrons, while no change was observed in the films fabricated using Mg Kα line irradiation. This is explained by the fact that core electron excitation breaks the Al–C bonds site-specifically.