Surface characterization of silica glass substrates treated by atomic hydrogen
Surface characterization of silica glass substrates treated by atomic hydrogen
复制标题
原子氢处理石英玻璃基材的表面表征
DOI：
10.1016/j.matchar.2013.10.002
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发表时间：
2013
影响因子：
4.7
通讯作者：
H. Kawazoe
中科院分区：
文献类型：
--
作者：
H. Inoue;A. Masuno;Y. Zhang;F. Utsuno;K. Koya;A. Fujinoki;H. Kawazoe
将具有非常平坦表面的石英玻璃基板在不同的温度和时间下暴露在原子氢中。用原子力显微镜测量了表面的均方根粗糙度和二维功率谱密度。在高达900℃的原子氢处理中，表面没有明显变化。通过1000℃的处理，观察了RMS粗糙度和PSD曲线的变化。结果表明，这些变化是由于氢原子与表面二氧化硅发生反应而引起的刻蚀。通过基于k-相关模型的分析发现，随着处理时间的增加，微凸体的空间频率变得更高。此外，数据还表明，通过控制热处理条件，原子氢可以使石英玻璃表面变平。
Silica glass substrates with very flat surfaces were exposed to atomic hydrogen at different temperatures and durations. An atomic force microscope was used to measure root-mean-square (RMS) roughness and two-dimensional power spectral density (PSD). In the treatment with atomic hydrogen up to 900 °C, there was no significant change in the surface. By the treatment at 1000 °C, the changes in the RMS roughness and the PSD curves were observed. It was suggested that these changes were caused by etching due to reactions of atomic hydrogen with surface silica. By analysis based on thek-correlation model, it was found that the spatial frequency of the asperities became higher with an increase of the treatment time. Furthermore, the data showed that atomic hydrogen can flatten silica glass surfaces by controlling heat-treatment conditions.