Visualizing the Effect of an Electrostatic Gate with Angle-Resolved Photoemission Spectroscopy

Visualizing the Effect of an Electrostatic Gate with Angle-Resolved Photoemission Spectroscopy
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DOI:
10.1021/acs.nanolett.9b00649
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发表时间:
2019-04-01
期刊:
影响因子:
10.8
通讯作者:
Velasco, Jairo, Jr.
Velasco, Jairo, Jr.
中科院分区:
材料科学1区
文献类型:
--
作者:
Joucken, Frederic;Avila, Jose;Velasco, Jairo, Jr.

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Electrostatic gating is pervasive in materials science, yet its effects on the electronic band structure of materials has never been revealed directly by angle-resolved photoemission spectroscopy (ARPES), the technique of choice to noninvasively probe the electronic band structure of a material. By means of a state-of-the-art ARPES setup with submicron spatial resolution, we have investigated a heterostructure composed of Bernal-stacked bilayer graphene (BLG) on hexagonal boron nitride and deposited on a graphite flake. By voltage biasing the latter, the electric field effect is directly visualized on the valence band as well as on the carbon is core level of BLG. The band gap opening of BLG submitted to a transverse electric field is discussed and the importance of intra layer screening is put forward. Our results pave the way for new studies that will use momentum-resolved electronic structure information to gain insight on the physics of materials submitted to the electric field effect.