Sub-Monolayer Control of Mixed-Oxide Support Composition in Catalysts via Atomic Layer Deposition: Selective Hydrogenation of Cinnamaldehyde Promoted by (SiO2-ALD)-Pt/Al2O3
Sub-Monolayer Control of Mixed-Oxide Support Composition in Catalysts via Atomic Layer Deposition: Selective Hydrogenation of Cinnamaldehyde Promoted by (SiO2-ALD)-Pt/Al2O3
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DOI:
10.1021/acscatal.8b02431
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发表时间:
2018-08
期刊:
影响因子:
12.9
通讯作者:
Zhihuan Weng;F. Zaera
中科院分区:
文献类型:
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作者:
Zhihuan Weng;F. Zaera
Alumina-supported platinum catalysts have been modified with silicon oxide thin films grown using atomic layer deposition (ALD) in order to tune the acid–base and electronic properties of the oxide, and their performance has been tested for the hydrogenation of cinnamaldehyde. It was found that the silica layers greatly increase the stability of the platinum nanoparticles, preventing their sintering during high-temperature calcinations without affecting access to the metal surface in any significant way; the extent of CO adsorption, measured by infrared absorption spectroscopy was found to decrease by only one-third after 6 SiO2 ALD cycles. Additional Bronsted and Lewis acid sites were created upon the deposition of submonolayer coverages of silicon oxide, as probed via pyridine adsorption. The addition of the silicon oxide thin films reduced the overall activity of these catalysts but also increased their selectivity toward the production of the unsaturated alcohol. In addition, both turnover frequencies...