Optical Thin Film Formation with O2 Cluster Ion Assisted Deposition
Optical Thin Film Formation with O2 Cluster Ion Assisted Deposition
复制标题
利用 O2 团簇离子辅助沉积形成光学薄膜
DOI：
10.1143/jjap.41.4291
复制
发表时间：
2002
影响因子：
1.5
通讯作者：
I. Yamada
中科院分区：
文献类型：
--
作者：
K. Shirai;Y. Fujiwara;R. Takahashi;N. Toyoda;S. Matsui;T. Mitamura;M. Terasawa;I. Yamada
O2团簇离子辅助沉积技术可用于制备先进光通信用光学多层膜。采用O2团簇离子辅助沉积技术制备了折射率为2.20（550 nm）、表面非常光滑（Ra=0.37 nm）的Ta 2 O 5薄膜。从扫描电子显微镜（SEM）图像，观察到致密的膜结构，而在O2团簇离子辅助层处没有多孔或柱状结构。由于团簇离子束的表面平滑效应，Ta_2O_5/SiO_2多层膜的表面和界面非常平整，即使下表面粗糙也能实现。多层膜的中心波长在环境测试之后的偏移相当小。
O2 cluster ion assisted deposition was demonstrated to form optical multilayer films for advanced optical communications. With O2 cluster ion assisted deposition, high refractive index 2.20 at 550 nm and very smooth surface (Ra=0.37 nm) of Ta2O5 films were realized. From a scanning electron microscope (SEM) image, dense film structure were observed without porous or columnar structures at the O2 cluster ion assisted layers. The surface and interface of Ta2O5/SiO2 multilayer films were very flat due to surface smoothing effect of cluster ion beams, and it can be realized even though the beneath surface was rough. The shift of a center wavelength of multilayer film was quite small after an environmental test.