Priority of the Mn Deposition Rate in Reactive Evaporation Conditions
Priority of the Mn Deposition Rate in Reactive Evaporation Conditions
复制标题
反应蒸发条件下锰沉积速率的优先顺序
DOI：
10.1143/jjap.39.6676
复制
发表时间：
2000
影响因子：
1.5
通讯作者：
Yasumitsu Ito
中科院分区：
文献类型：
--
作者：
M. Isai;H. Ichikawa;T. Shimada;K. Morimoto;H. Fujiyasu;Yasumitsu Ito
采用反应蒸发法制备了锂二次电池中使用的锰（Mn）氧化物薄膜。使用该方法的问题之一是坩埚中的锰蒸发物在氧气气氛中发生氧化。随着沉积运行的增加，这会降低 Mn 沉积速率。在锰坩埚的底部引入分离器。它可以成功地将锰蒸发物与进入的氧原子隔离。薄膜特性取决于氧气流量、锰沉积速率和基材温度。这三个参数彼此密切相关。与其他参数相比，锰沉积速率的重要性得到了认可。 Mn 沉积速率由两个参数控制。一是源温度，二是分离器孔径大小。在锰沉积速率为3~10 Å/s、分离器孔径为6 mmφ、源温为960°C、壁温为900°C、氧气流量为5 sccm的条件下，可以制备出黑锰矿结构的Mn3O4薄膜。
Manganese (Mn) oxide films used in lithium secondary batteries were prepared using the reactive evaporation method. One of the problems of using this method is that the manganese evaporant in the crucible suffers oxidation in an oxygen atmosphere. This deteriorates the Mn deposition rate with increasing the deposition run. A separator was introduced in the bottom of the Mn crucible. It could successfully isolate Mn evaporant from incoming oxygen atoms. The film properties depend on the oxygen flow rate, Mn deposition rate, and substrate temperature. These three parameters correlate closely with each other. The importance of Mn deposition rate compared to the rest of the parameters was recognized. The Mn deposition rate is governed by two parameters. One is the source temperature, and the other is the aperture size of the separator. The Mn3O4 films with a hausmannite structure can be prepared under the conditions of Mn deposition rate of 3–10 Å/s, separator aperture size of 6 mmφ, source temperature of 960°C, wall temperature of 900°C and oxygen flow rate of 5 sccm.