Oxidation resistance of Ru-capped EUV multilayers

Oxidation resistance of Ru-capped EUV multilayers
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钌覆盖的 EUV 多层膜的抗氧化性

DOI:
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发表时间:
2005
期刊:
SPIE Advanced Lithography
影响因子:
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通讯作者:
N. Edwards
N. Edwards
中科院分区:
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文献类型:
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作者:
S. Bajt;Z. Dai;E. Nelson;M. Wall;J. Alameda;N. Nguyen;S. Baker;J. Robinson;John S. Taylor;M. Clift;A. Aquila;E. Gullikson;N. Edwards

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在Mo/Si EUV多层膜上沉积的钌覆盖层,其特征在于使用一套计量学来建立其在沉积状态下的基线结构、光学和表面性质。测试相同的覆盖层结构的热稳定性和抗氧化性。尸检表征确定了加速试验引起的变化。最好的表现Ru-帽层结构进行了详细的研究,用透射电子显微镜,以确定晶粒显微结构和纹理。这些信息对于EUVL多层膜的建模和性能优化至关重要。
Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.