Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
复制标题
用于光电集成电路的微米级光波导
DOI：
10.1143/jjap.33.822
复制
发表时间：
1994
影响因子：
1.5
通讯作者：
Mitsumasa Koyanagi Mitsumasa Koyanagi
中科院分区：
文献类型：
--
作者：
T. Nagata;Tsuyoshi Tanaka;Kouji Miyake;H. Kurotaki;Shin Yokoyama Shin Yokoyama;Mitsumasa Koyanagi Mitsumasa Koyanagi
超大规模集成电路芯片光学互连的基础技术是利用传统的硅大规模集成电路工艺开发出来的。分别采用低压化学气相沉积(LPCVD)和常压化学气相沉积(APCVD)方法制备了由Si3N4芯层和SiO_2包层组成的微米级光波导。还制作了用于层间互连的将光传输方向从垂直方向改变为水平方向的小透镜和微米级反射镜。
Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.