Direct UV written waveguides and Bragg gratings in doped planar silica using a 213 nm laser
Direct UV written waveguides and Bragg gratings in doped planar silica using a 213 nm laser
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DOI：
10.1049/ell2.12126
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发表时间：
2021-03
影响因子：
1.1
通讯作者：
Q. S. Ahmed;P. Gow;C. Holmes;P. Mennea;James W. Field;R. Bannerman;Devin H. Smith;C. Gawith;Philip Smith;J. Gates
中科院分区：
文献类型：
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作者：
Q. S. Ahmed;P. Gow;C. Holmes;P. Mennea;James W. Field;R. Bannerman;Devin H. Smith;C. Gawith;Philip Smith;J. Gates
在本文中，第一个演示的同时紫外写入布拉格光栅和波导中的锗和硼掺杂的平面二氧化硅使用五次谐波固态纳秒激光器工作在213 nm波长。证明了通过使用高峰功率密度制造高质量光栅，产生足够的均匀性并且没有任何表面损伤。通过测量光模的局域有效折射率研究了掺杂二氧化硅层的光敏性。写入的光栅用于测量光栅折射率调制、光栅失谐带宽和波导传播损耗，最小值为0.28 ± 0.07 dB cm −1。本文表明，这种新一代的脉冲紫外激光器是一个有前途的替代传统的较长波长的CW激光源用于小光斑直接光栅写入掺杂二氧化硅。
In this paper, the first demonstration of simultaneous UV written Bragg gratings and waveguides in germanium and boron‐doped planar silica is presented using a 5th harmonic solid‐state nanosecond laser operating at 213 nm wavelength. The fabrication of high‐quality gratings by using a high peak power density, yielding sufficient uniformity and without any surface damage is demonstrated. The photosensitivity of the doped silica layer is investigated by measuring the local effective refractive index of the optical modes. The written gratings are used to measure grating refractive index modulation, grating detuning bandwidth and the waveguide propagation loss with a minimum value of 0.28 ± 0.07 dB cm −1. This paper shows that this new generation of pulsed UV lasers is a promising alternative for conventional longer wavelength CW laser sources used in small spot direct grating writing in doped silica.