Spatial periodicities inside the Talbot effect: understanding, control and applications for lithography.
Spatial periodicities inside the Talbot effect: understanding, control and applications for lithography.
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DOI：
10.1364/oe.431698
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发表时间：
2021-08
期刊：
影响因子：
3.8
通讯作者：
P. Chaussé;P. Shields
中科院分区：
文献类型：
--
作者：
P. Chaussé;P. Shields
位移塔尔博特光刻（DTL）是一种简单的图案化技术，用于在高达200 mm直径的晶片区域上创建周期性亚微米特征，用于例如等离子体、光子晶体和超材料中的应用。它利用了衍射和干涉一般避免在经典光刻。塔尔博特效应是相干光照射的周期性掩模的周期性空间重复，是DTL的基础。这种现象的建模是必不可少的，以充分理解和预测所获得的干涉图案;掩模周期大于两倍的波长，新的空间周期性一般被引入小于塔尔博特长度。本研究报告模拟多个1D掩模来解释这些较小的空间周期性对塔尔博特效应的影响。通过改变掩模配置，可以定制空间周期性贡献，从而控制基于塔尔博特效应的光刻的特征尺寸、均匀性和对比度。
Displacement Talbot Lithography (DTL) is a simple patterning technique for creating periodic sub-micron features on wafer areas up to 200 mm diameter for applications in, for example, plasmonic, photonic crystals, and metamaterials. It exploits the diffraction and interference generally avoided in classical lithography. The Talbot effect, on which DTL is based, is the periodic spatial repetition of a periodic mask illuminated by coherent light. The modelling of this phenomenon is essential to fully understand and predict the interference pattern obtained; for mask periods greater than twice the wavelength, new spatial periodicities are generally introduced that are smaller than the Talbot length. This study reports simulations of multiple 1D masks to explain the influence of these smaller spatial periodicities on the Talbot effect. By changing the mask configuration, one can tailor the spatial periodicity contributions and thus, control the feature size, uniformity, and contrast for Talbot-effect-based lithography.