Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
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DOI：
10.1143/jjap.35.l341
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发表时间：
1996-03
影响因子：
1.5
通讯作者：
M. Nagatsu;Ge Xu;M. Yamage;M. Kanoh;Hideo Sugai Hideo Sugai-Hideo-Sugai
中科院分区：
文献类型：
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作者：
M. Nagatsu;Ge Xu;M. Yamage;M. Kanoh;Hideo Sugai Hideo Sugai-Hideo-Sugai
使用小型缝隙天线的微波发射器，在 140 Pa 的氩气中通过 2.45 GHz–1 kW 放电产生大平面（直径 22 cm）高密度（∼2×1012 cm-3）等离子体。在微波照射的等离子体表面附近测量光发射强度和微波场强度的二维分布。光发射和微波场都清楚地显示出在较高压力 (140 Pa) 下方位角模式 m=3 和径向模式 n=3 的固定模式，而在较低压力 (44 Pa) 下观察到模式变化为 m=6 和 n=2。这些图案归因于截止层附近驻表面波的激发和吸收。
A large-planar (22 cm diam.) high-density ( ∼2×1012 cm-3) plasma is produced in argon gas at 140 Pa by 2.45 GHz–1 kW discharges, using a microwave launcher of small slot antennas. The two-dimensional distributions of optical emission intensities as well as microwave field intensities are measured near the plasma surface irradiated with microwaves. Both the optical emission and the microwave field clearly show stationary patterns of azimuthal mode m=3 and radial mode n=3 at higher pressures (140 Pa), while a mode change to m=6 and n=2 is observed at lower pressures (44 Pa). These patterns are attributed to the excitation and absorption of standing surface waves near the cutoff layer.