Characteristics of Hall effect plasma accelerator for industrial application
Characteristics of Hall effect plasma accelerator for industrial application
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DOI：
10.1063/1.1144959
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发表时间：
1994-04
影响因子：
1.6
通讯作者：
Wooong Chae Kim;K. Chung;Byung-Ho Choi
中科院分区：
文献类型：
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作者：
Wooong Chae Kim;K. Chung;Byung-Ho Choi
对于薄膜制备和表面改性，需要具有高电流、低能量和宽束流的离子源。该源应操作简单可靠，机械坚固，并且对于商业用途具有高生产率。为了满足这些要求，霍尔效应等离子体加速器已被制造和测试。用该源获得了200-300 eV的束流能量和高达10 mA/cm ~ 2的束流密度。介绍了其工作特性和工业应用的可能性。
For thin film fabrication and surface modification, ion sources with high current, low energy, and broad beam are required. The source should be simple and reliable to operate, mechanically rugged, and highly productive for commercial use. To meet these requirements, a Hall effect plasma accelerator has been manufactured and tested. A beam energy of 200–300 eV and a beam current density of up to 10 mA/cm2 have been obtained with the source. Operational characteristics and possibility for industrial application are presented.