Thermal annealing effect on magnetism and cation distribution in disordered ZnFe2O4 thin films deposited on glass substrates
Thermal annealing effect on magnetism and cation distribution in disordered ZnFe2O4 thin films deposited on glass substrates
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DOI：
10.1016/j.jmmm.2006.11.144
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发表时间：
2007-03
影响因子：
2.7
通讯作者：
S. Nakashima;K. Fujita;Katsuhisa Tanaka;K. Hirao;Tomoyuki Yamamoto;I. Tanaka
中科院分区：
文献类型：
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作者：
S. Nakashima;K. Fujita;Katsuhisa Tanaka;K. Hirao;Tomoyuki Yamamoto;I. Tanaka
研究了热退火对用溅射法在石英玻璃衬底上沉积的无序锌铁氧体（ZnFe2O4）薄膜磁性能的影响。室温下的磁化强度通过在相对低的温度（例如300°C）下退火而增强，并且通过在较高温度下退火而降低。X射线吸收近边结构表明，在300°C退火的ZnFe_2O_4薄膜具有与沉积态薄膜相似的无序阳离子分布。推测在300°C下退火增强的磁化强度是由于无序的ZnFe_2O_4晶体从沉积薄膜中形成的非晶基体中沉淀出来。
The effect of thermal annealing on magnetic properties has been investigated for disordered zinc ferrite (ZnFe2O4) thin films deposited on silica glass substrates using a sputtering method. The magnetization at room temperature is enhanced by annealing at relatively low temperature such as 300°C and decreased by annealing at higher temperatures. X-ray absorption near edge structures indicate that ZnFe2O4thin film annealed at 300°C possesses disordered cation distribution similar to that for as-deposited thin film. It is presumed that the enhancement of magnetization by annealing at 300°C is due to precipitation of disordered ZnFe2O4crystal from an amorphous matrix formed in the as-deposited thin film.