Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering
Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering
复制标题
溅射温度对磁控溅射NiO薄膜结构和光学性能的影响
DOI：
10.1007/s11664-017-5453-5
复制
发表时间：
2017
影响因子：
2.1
通讯作者：
Tang Miaomiao
中科院分区：
文献类型：
--
作者：
Wang Hui;Zhao Yang;Li Xinzhong;Zhen Zhiqiang;Li Hehe;Wang Jingge;Tang Miaomiao
利用射频磁控溅射系统在蓝宝石和康宁1737玻璃衬底上制备了NiO薄膜。对不同溅射温度下生长的NiO薄膜的结构、光学和电学性能进行了深入的研究。NiO薄膜由不同尺寸的NiO纳米颗粒组成，具有强烈的(111)择优取向。随着溅射温度的升高，NiO的晶粒度增大。随着溅射温度从30℃升高到450℃，NiO样品的带隙从3.69 eV降至3.38 eV。利用霍尔效应研究了NiO样品的电学性质变化。
NiO thin films were deposited on sapphire and Corning 1737 glass substrates using the radio frequency magnetron sputtering system. The structures, optical and electrical properties of NiO films grown under different sputtering temperatures were thoroughly studied. The NiO films were composed of different-size NiO nano-grains with a strong (111) preferred orientation. The NiO grain size increased with the sputtering temperature increase. The band gap values decreased from 3.69 eV to 3.38 eV on the sputtering temperature increase from 30°C to 450°C. Moreover, the electrical property variations of the NiO samples were studied by the Hall effect in detail.