Fabrication and Hydrogen Permeation Properties of Epitaxial Er2O3 Films Revealed by Nuclear Reaction Analysis
Fabrication and Hydrogen Permeation Properties of Epitaxial Er2O3 Films Revealed by Nuclear Reaction Analysis
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DOI：
10.1021/acs.jpcc.6b02864
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发表时间：
2016-07
影响因子：
3.7
通讯作者：
W. Mao;M. Wilde;T. Chikada;S. Ogura;K. Fukutani;T. Terai;H. Matsuzaki
中科院分区：
文献类型：
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作者：
W. Mao;M. Wilde;T. Chikada;S. Ogura;K. Fukutani;T. Terai;H. Matsuzaki
为了评估氧化铒薄膜在氢（H）渗透阻挡层等应用中的潜力，我们通过离子束溅射沉积在Si（100）作为外延衬底上制备了高质量的Er 2 O3薄膜。薄膜的物理结构进行了表征，其特征在于通过扫描X射线衍射，和氢渗透通过Er 2 O3薄膜在氢气中退火后的过程中阐明了H深度剖析与核反应分析。结果表明，制备的准单晶Er 2 O3（110）薄膜在873 K下的氢溶解度、扩散系数和磁导率分别为（1.1 ± 0.2）× 102 mol m-3、（7.2 ± 1.4）× 10-22 m2 s-1和（3.8 ± 1.5）× 10-22 mol Pa-1/2 m-1 s-1。在我们的准单晶Er 2 O3（110）薄膜和理想体Er 2 O3之间的氢渗透性的剩余差异证明了残余缺陷（例如，孔）存在于薄膜中。
In order to evaluate the potential of erbium oxide films in applications such as hydrogen (H) permeation barriers, we fabricated high-quality Er2O3 thin films by ion beam sputter deposition on Si(100) as an epitaxial substrate. The physical structures of the thin films were characterized by scanning X-ray diffraction, and the process of hydrogen permeation through the Er2O3 films upon annealing in H2 was elucidated by H depth profiling with nuclear reaction analysis. The results show that quasi-single-crystalline Er2O3(110) thin films can be produced that feature a hydrogen solubility, diffusivity, and permeability at 873 K of (1.1 ± 0.2) × 102 mol m–3, (7.2 ± 1.4) × 10–22 m2 s–1, and (3.8 ± 1.5) × 10–22 mol Pa–1/2 m–1 s–1, respectively. The remaining difference in hydrogen permeability between our quasi-single-crystalline Er2O3(110) thin films and that expected for ideal bulk Er2O3 attests to the negative role of residual defects (e.g., pores) that exist in the thin films.