Femtosecond laser near-field nanoablation patterning using Mie resonance high dielectric constant particle with small size parameter
Femtosecond laser near-field nanoablation patterning using Mie resonance high dielectric constant particle with small size parameter
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DOI：
10.1063/1.3458704
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发表时间：
2010-06-28
影响因子：
4
通讯作者：
Obara, Minoru
中科院分区：
文献类型：
--
作者：
Tanaka, Yuto;Obara, Go;Obara, Minoru
我们展示了近场纳米孔图案化使用米氏共振，小尺寸参数粒子的纳米纤维技术，无论基板的折射率。在400 nm的激发波长下，用200 nm的磁四极共振散射模式（n = 2.7）在低折射率SiO2和高折射率Si衬底上同时获得了相同尺寸的介质颗粒之间的最大增强因子和几乎最小的光斑直径。使用200 nm的非晶TiO 2颗粒（n=2.66+0.024i）在两个衬底上制造直径约为100 nm的圆形纳米孔，即使激光能量密度低于裸衬底的一半烧蚀阈值。(C)2010年美国物理学会。[doi：10.1063/1.3458704]
We demonstrate near-field nanohole patterning using a Mie resonance, small size parameter particle for nanofabrication technology regardless of substrate's refractive index. Maximal enhancement factor and nearly smallest spot diameter among the same size dielectric particles are simultaneously obtainable on both low-refractive-index SiO2 and high-refractive-index Si substrates with a 200 nm particle of magnetic quadrupole resonance scattering mode (n similar to 2.7) at 400 nm excitation wavelength. Circular nanoholes with approximately 100 nm in diameter were fabricated on both substrates using a 200 nm amorphous TiO2 particle (n=2.66+0.024i) even with lower laser fluences than a half ablation threshold of the bare substrates. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3458704]