Effects of Process Gases and Gate TiN Electrode during the Post Deposition Anneal to ALD-Al2O3 Dielectric Film
Effects of Process Gases and Gate TiN Electrode during the Post Deposition Anneal to ALD-Al2O3 Dielectric Film
复制标题
ALD-Al2O3 电介质膜沉积后退火过程中工艺气体和 TiN 栅电极的影响
DOI：
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发表时间：
2018
期刊：
影响因子：
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通讯作者：
Rihito Kuroda and Shigetoshi Sugawa
中科院分区：
文献类型：
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作者：
Masaya Saito;Akinobu Teramoto;Tomoyuki Suwa;Kenshi Nagumo;Yoshinobu Shiba;Rihito Kuroda and Shigetoshi Sugawa
