Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction
Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction
复制标题
热 CVD 制备的氧化钛 (IV) 光催化薄膜通过牺牲反应产生氢气的基板依赖性能力
DOI：
10.1002/cvde.201004298
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发表时间：
2010
影响因子：
--
通讯作者：
Hyett G
中科院分区：
文献类型：
--
作者：
Hyett G
我们报道了用紫外光照射时光电二极管产生氢的观察结果。这些光电二极管由不锈钢基底组成，一侧使用APCVD沉积TiO2光催化剂，另一侧使用溅射涂层沉积Pt。相比之下，使用钛基材制成的类似装置显示没有可测量的H2产生。
We report the observation of hydrogen production from photodiodes, when irradiated with UV light. These photodiodes were composed of a stainless steel substrate, with a TiO2photocatalyst deposited suing APCVD on one side and Pt deposited using sputter coating on the other. In contrast similar devices made using a titanium substrate show no measurable H2production.