Electrical properties of amorphous-Al2O3/single-crystal ZnO heterointerfaces

Electrical properties of amorphous-Al2O3/single-crystal ZnO heterointerfaces
复制标题

DOI:
10.1063/1.4826538
复制
发表时间:
2013-10
影响因子:
4
通讯作者:
J. Liu;A. Kobayashi;J. Ohta;H. Fujioka;M. Oshima
J. Liu;A. Kobayashi;J. Ohta;H. Fujioka;M. Oshima
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
J. Liu;A. Kobayashi;J. Ohta;H. Fujioka;M. Oshima

文献摘要

相似文献

研究了Al/Al2O3/ZnO(0001¯)和Al/Al2O3/ZnO(0001)金属绝缘体半导体(MIS)二极管的电学性能。它们的电容电压曲线表明,Al/Al2O3/ZnO(0001¯)MIS二极管的固定电荷密度和捕获电荷密度低于Al/Al2O3/ZnO(0001)二极管。x射线光电子能谱显示,高质量Al2O3/ZnO(0001¯)异质界面的价带偏移为1.2±0.2 eV。这些结果表明,Al2O3/ZnO(0001¯)异质界面可以被认为是制造ZnO基场效应晶体管的合适组合。
Electrical properties of Al/Al2O3/ZnO (0001¯) and Al/Al2O3/ZnO (0001) metal-insulator-semiconductor (MIS) diodes have been investigated. The capacitance-voltage curves of them suggest that there are lower fixed and trapped charge densities for the Al/Al2O3/ZnO (0001¯) MIS diode than those for the Al/Al2O3/ZnO (0001) one. X-ray photoelectron spectroscopy has revealed that the valence band offset of the high-quality Al2O3/ZnO (0001¯) heterointerface is 1.2 ± 0.2 eV. These findings indicate that the Al2O3/ZnO (0001¯) heterointerface can be regarded as a suitable combination for the fabrication of ZnO-based field effect transistors.