Electrical properties of amorphous-Al2O3/single-crystal ZnO heterointerfaces
Electrical properties of amorphous-Al2O3/single-crystal ZnO heterointerfaces
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DOI:
10.1063/1.4826538
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发表时间:
2013-10
影响因子:
4
通讯作者:
J. Liu;A. Kobayashi;J. Ohta;H. Fujioka;M. Oshima
中科院分区:
文献类型:
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作者:
J. Liu;A. Kobayashi;J. Ohta;H. Fujioka;M. Oshima
Electrical properties of Al/Al2O3/ZnO (0001¯) and Al/Al2O3/ZnO (0001) metal-insulator-semiconductor (MIS) diodes have been investigated. The capacitance-voltage curves of them suggest that there are lower fixed and trapped charge densities for the Al/Al2O3/ZnO (0001¯) MIS diode than those for the Al/Al2O3/ZnO (0001) one. X-ray photoelectron spectroscopy has revealed that the valence band offset of the high-quality Al2O3/ZnO (0001¯) heterointerface is 1.2 ± 0.2 eV. These findings indicate that the Al2O3/ZnO (0001¯) heterointerface can be regarded as a suitable combination for the fabrication of ZnO-based field effect transistors.