Solutions to mitigate parasitic NPN bipolar action in high voltage analog technologies

Solutions to mitigate parasitic NPN bipolar action in high voltage analog technologies
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减轻高压模拟技术中寄生 NPN 双极作用的解决方案

DOI:
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发表时间:
2010
期刊:
Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2010
影响因子:
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通讯作者:
J. Brodsky
J. Brodsky
中科院分区:
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文献类型:
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作者:
A. Salman;G. Boselli;H. Kunz;J. Brodsky

文献摘要

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这是一项针对高压 BiCMOS 技术的寄生 NPN 过早导通的研究。在这项工作中,我们将研究几种抑制其开启的方法。使用 TCAD 和 TLP,我们将研究基于增加井间距、井偏移、自我保护和通过高掺杂基极注入减少 β 的解决方案。我们还将研究与每个解决方案相关的局限性。
This is a study of the parasitic NPN premature turn-on for high voltage BiCMOS technologies. In this work, we will investigate several methods to suppress its turn-on. Using TCAD and TLP we will investigate solutions based on increased well spacing, offset of wells, self-protection and beta reduction through highly doped base implant. We will also investigate the limitations associated with each of these solutions.