High aspect ratio electrostatic micro actuators using LIGA process
High aspect ratio electrostatic micro actuators using LIGA process
复制标题
采用 LIGA 工艺的高纵横比静电微型执行器
DOI：
10.1007/s005420000064
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发表时间：
2000
期刊：
影响因子：
--
通讯作者：
S. Sugiyama
中科院分区：
文献类型：
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作者：
R. Kondo;S. Takimoto;K. Suzuki;S. Sugiyama
采用LIGA工艺制作了大功率静电微驱动器。设计并制作了梳齿驱动型驱动器和摆动电机。微致动器的基本结构由Ni的可动电极和固定电极、SiO2的牺牲层和Si衬底组成，并通过一次掩模工艺实现。作为设计规则，确定了2 μm的最小抗蚀剂宽度、120 μm的抗蚀剂高度、10 μm的可移动部分的最大宽度、40 μm的固定部分的最小宽度以及约100 V的驱动电压。通过浇铸方法在Si衬底上形成120 μ m厚的PMMA抗蚀剂。使用紧凑型SR源“AURORA”，使用在2 μ m厚的多晶硅膜上具有7 μ m厚的Au吸收体的X射线掩模，对PMMA进行曝光。曝光的PMMA通过显影剂显影。采用电铸方法制备了高100 μ m、最小宽度2 μ m、最小间隙2 μ m、最大深宽比50的Ni微结构。用于可移动电极的Ni微结构通过SiO2的横向蚀刻从衬底分离。在SiO2的横向蚀刻之后，将Au线键合到电极。确认梳齿驱动型致动器的致动和摆动电机的旋转。施加到梳状驱动致动器和摆动电机的电压为65和125 V。
High-power electrostatic microactuators using LIGA process have been fabricated. Comb drive type actuators and a wobble motor were designed and fabricated. A basic structure of the microactuators was composed of movable and fixed electrodes of Ni, a sacrificial layer of SiO2and a Si substrate, and carried out by one mask process. As design rules, a minimum resist width of 2 μm, resist height of 120 μm, maximum width of movable parts of 10 μm, minimum width of fixed parts of 40 μm and driving voltage of about 100 V, were decided. A 120 μm-thick PMMA resist was formed on a Si substrate by a casting method. The PMMA was exposed using a compact SR source “AURORA”, using an X-ray mask with 7 μm-thick Au absorber on a 2 μm-thick poly-Si membrane. The exposed PMMA was developed by a developer. Ni microstructures with 100 μm-height, 2 μm-minimum width, 2 μm-minimum gap, and then maximum aspect ratio of 50, were made by electroforming. Ni microstructures used for movable electrodes were separated from the substrate by lateral etching of SiO2. After lateral etching of SiO2, Au wires were bonded to electrodes. Actuation of the comb drive type actuator and rotation of the wobble motor were confirmed. The applied voltage to the comb drive actuator and the wobble motor were 65 and 125 V.