High current and high intensity pulsed ion-beam sources for combined treatment of materials
High current and high intensity pulsed ion-beam sources for combined treatment of materials
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DOI：
10.1063/1.1150293
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发表时间：
2000-02
影响因子：
1.6
通讯作者：
A. Ryabchikov;A. Petrov;I. Stepanov;I. Shulepov;V. G. Tolmachjeva
中科院分区：
文献类型：
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作者：
A. Ryabchikov;A. Petrov;I. Stepanov;I. Shulepov;V. G. Tolmachjeva
本文叙述了用不同峰值功率的加速离子束和金属等离子体流联合处理材料的复杂装置。该装置包括高电流重复脉冲真空弧离子源、高强度脉冲离子束源和直流真空弧等离子体源，并与等离子体过滤器相结合，用于对微粒部分进行等离子体清洁。结果表明，纳秒脉冲强流离子束预处理不锈钢样品，可降低钨离子注入时的离子溅射系数。结果表明，高功率离子束改变了样品的表面形貌和元素结构，从而影响了最大注入钨浓度的提高。
The complex installation for combined materials treatment with accelerated ion beams of different peak power and metallic plasma flows is described. The installation comprises the high-current repetitively pulsed vacuum arc ion source, high-intensity pulsed ion beam source, and direct-current vacuum arc plasma source combined with the plasma filter for plasma cleaning from the microparticle fraction. It has been found that the preliminary treatment of stainless steel samples with the high-power ion beam of nanosecond pulse duration results in the reduction of ion sputtering coefficient at the implantation of tungsten ions. It has been shown that the increase of maximum implanted tungsten concentration is influenced by changing the surface morphology and element structure of the samples affected by the high-power ion beam.