Continuous Ellipsometric Determination of the Optical Constants and Thickness of a Silver Film during Deposition
Continuous Ellipsometric Determination of the Optical Constants and Thickness of a Silver Film during Deposition
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沉积过程中银膜光学常数和厚度的连续椭圆偏振测定
DOI：
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发表时间：
1969
期刊：
影响因子：
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通讯作者：
A. Kinbara
中科院分区：
文献类型：
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作者：
T. Yamaguchi;S. Yoshida;A. Kinbara
描述了一种利用自动记录椭偏仪获得沉积过程中金属薄膜的光学常数和厚度的方法。在薄膜沉积过程中，连续测量了恢复的方位角ψ、反射Δ上的微分相变和透过率T。根据这三个量计算了光学常数和填充因子，并给出了不同沉积条件下薄膜厚度的函数。
A method for obtaining the optical constants and thickness of thin metal films during deposition using an automatic recording ellipsometer is described. The restored azimuth ψ, the differential phase change on reflection Δ and the transmittance T have been continuously meaured during the film deposition. The optical constants and the packing factor are calculated from these three quantities and are given as functions of film thickness for various deposition conditions.