Optical imaging beyond the diffraction limit by SNEM: effects of AFM tip modifications with thiol monolayers on imaging quality.
Optical imaging beyond the diffraction limit by SNEM: effects of AFM tip modifications with thiol monolayers on imaging quality.
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DOI：
10.1016/j.ultramic.2014.12.001
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发表时间：
2015-03
期刊：
影响因子：
2.2
通讯作者：
Aysegul Cumurcu;Jordi Díaz;I. Lindsay;Sissi de Beer;Joost Duvigneau;P. Schön;G. Julius Vancso
中科院分区：
文献类型：
--
作者：
Aysegul Cumurcu;Jordi Díaz;I. Lindsay;Sissi de Beer;Joost Duvigneau;P. Schön;G. Julius Vancso
