Tribological behaviors of Pb/MoS2 film under electrical condition in vacuum
Tribological behaviors of Pb/MoS2 film under electrical condition in vacuum
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真空电条件下Pb/MoS2薄膜的摩擦学行为
DOI：
10.1088/2053-1591/ab144b
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发表时间：
2019-04
影响因子：
2.3
通讯作者：
Lina Zhu
中科院分区：
文献类型：
--
作者：
Peng Wang;Guangan Zhang;Zhibin Lu;Wen Yue;Lina Zhu
研究了Pb/MoS_2复合薄膜在真空载流条件下对Al球和Cu球的摩擦学行为，并探讨了其摩擦学机理。当对Al球进行测试时，Pb/MoS 2膜的摩擦系数和磨损率在电流小于0.3 A时降低，在更高的电流条件下增加，在电流下的主要磨损机制是粘着磨损。当电流从0 A增加到0.9 A时，Pb/MoS 2薄膜与Cu球的摩擦系数和磨损率均较大，其失效机制为粘着磨损、磨粒磨损和耦合作用。
The tribological behaviors of sputter-deposited Pb/MoS2 film against Al balls and Cu balls under electric currents in vacuum, and the potential mechanisms of the film were investigated. When tested against Al balls, both friction coefficients and wear rates of the Pb/MoS2 film decreased when the currents were less than 0.3 A, and increased at higher electric current conditions; the main wear mechanism was the adhesive wear under electric currents. Differently, the Pb/MoS2 film showed large friction coefficients and wear rates when tested against Cu balls with the current increasing from 0 A to 0.9 A; the failure mechanism was the adhesive wear, abrasive wear and the coupling effect.
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