Nanostructured platinum (HI-ePt) films:: Effects of electrodeposition conditions on film properties
Nanostructured platinum (HI-ePt) films:: Effects of electrodeposition conditions on film properties
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DOI：
10.1021/cm991077t
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发表时间：
1999-12-01
影响因子：
8.6
通讯作者：
Owen, JR
中科院分区：
文献类型：
--
作者：
Elliott, JM;Attard, GS;Owen, JR
系统研究了沉积条件对六方溶致液晶相六氯铂酸（HCPA）电还原获得的高表面积（高达460 m(2) cm(-3)）介孔铂薄膜（H-I-ePt）的电化学性能和纳米结构的影响。纳米结构的表面积、重复距离和规则性以及薄膜的表面形态取决于沉积条件。特别是，发现沉积电势对薄膜表面积和纳米结构的均匀性有显着影响。所获得的结果可以通过沉积过程效率的变化和竞争反应的相对贡献来解释。发现提高电沉积温度可显着增加薄膜的表面积并增加纳米结构的重复距离。此外，随着温度的升高，观察到薄膜在微米和纳米尺度上变得粗糙。我们还发现，随着电荷在电沉积过程中通过，电沉积薄膜的厚度呈线性变化，并且体积表面积恒定，这表明孔系统的可及性是均匀的。
A systematic investigation into the effects of deposition conditions on the electrochemical properties and nanostructure of high surface area (up to similar to 460 m(2) cm(-3)) mesoporous platinum films (H-I-ePt) obtained by electroreduction of hexachloroplatinic acid (HCPA) from an hexagonal lyotropic liquid crystalline phase is reported. The surface area, repeat distance, and regularity of the nanostructure and the surface morphology of the films were shown to depend on the deposition conditions. In particular, the deposition potential was found to have a notable effect on the film surface area and on the uniformity of nanostructure, The results obtained are explained by variations in the efficiency of the deposition process and the relative contributions of competing reactions. Increasing the temperature of electrodeposition was found to increase significantly the surface areas of the films and to increase the repeat distance of the nanostructure, In addition, a roughening of the films on both a micro- and a nanometer scale was observed with an increase in temperature. We also found that the thickness of the electrodeposited films scaled linearly and that the volumetric surface area was constant, with the charge passed during the electrodeposition process, indicating uniform accessibility of the pore system.