Spacer-Defined Intrinsic Multiple Patterning
Spacer-Defined Intrinsic Multiple Patterning
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DOI：
10.1021/acsnano.0c05497
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发表时间：
2020-09-22
期刊：
影响因子：
17.1
通讯作者：
Papakonstantinou, Ioannis
中科院分区：
文献类型：
--
作者：
Laney, Sophia Katharine;Li, Tao;Papakonstantinou, Ioannis
周期性纳米管阵列通过与光和物质的相互作用增强了功能特性，但要达到技术上突出应用的最佳性能，如润湿性或光子学，结构微调是必不可少的。尽管如此，提供独立尺寸控制、高纵横比和进一步结构复杂性的前景的通用和可扩展的方法仍然没有实现。在这里，我们通过原子层沉积（ALD）实现的多重图案化来回答这一需求。与以前的方法不同，ALD沉积的间隔物直接施加在预图案化的目标衬底材料上，用作蚀刻掩模以产生大量定制的纳米管。通过概念迭代，我们进一步实现了同心和/或二元纳米阵列在一些工业上重要的材料，如硅，玻璃和聚合物。为了证明所实现的结构的质量和适用性，我们探讨了纳米管微调如何引起宽带反射，并提出了一个表面，具有极低的反射率，
Periodic nanotube arrays render enhanced functional properties through their interaction with light and matter, but to reach optimal performance for technologically prominent applications, such as wettability or photonics, structural fine-tuning is essential. Nonetheless, a universal and scalable method providing independent dimension control, high aspect ratios, and the prospect of further structural complexity remains unachieved. Here, we answer this need through an atomic layer deposition (ALD)-enabled multiple patterning. Unlike previous methods, the ALD-deposited spacer is applied directly on the prepatterned target substrate material, serving as an etching mask to generate a multitude of tailored nanotubes. By concept iteration, we further realize concentric and/or binary nanoarrays in a number of industrially important materials such as silicon, glass, and polymers. To demonstrate the achieved quality and applicability of the structures, we probe how nanotube fine-tuning induces broadband antireflection and present a surface boasting extremely low reflectance of