Ultralow Friction Behaviors of Hydrogenated Fullerene-Like Carbon Films: Effect of Normal Load and Surface Tribochemistry
Ultralow Friction Behaviors of Hydrogenated Fullerene-Like Carbon Films: Effect of Normal Load and Surface Tribochemistry
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氢化类富勒烯碳膜的超低摩擦行为：法向载荷和表面摩擦化学的影响
DOI：
10.1007/s11249-010-9739-5
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发表时间：
2011-03
影响因子：
3.2
通讯作者：
Zhang, J. Y.
中科院分区：
文献类型：
--
作者：
Wang, Z.;Wang, C. B.;Zhang, B.;Zhang, J. Y.
在往复滑动摩擦磨损试验机上，研究了氢化富勒烯(H-FLC)碳膜与氮化硅陶瓷球在1~20nN接触载荷下的摩擦磨损行为。结果表明，薄膜表现出非Amontonian摩擦行为，摩擦系数随法向接触载荷的增加而减小：接触载荷为1 N时，摩擦系数约为0.112，载荷为20 N时，摩擦系数降至超低值(~0.009)。在不同的接触压力下，低摩擦磨损的主要机制是在滑动界面形成和停留的氢化碳转移膜。此外，独特的富勒烯结构导致H-FLC膜具有良好的弹性性能(弹性恢复率为78%)，这有利于高负载容限，并导致在空调下的低磨损率。对于在空气中20℃N载荷下测试的超低COF为0.009的薄膜，飞行时间二次离子质谱仪(TOF-SIMS)采集的磨痕内外信号表明，在H-FLC薄膜表面进行摩擦学测试后，存在C2H3−和C2H5−碎片。我们认为，H-FLC膜的摩擦化学和弹性性能是导致摩擦行为的原因，含氢碳转移膜的高负荷耐受性和化学惰性而不是转移膜的石墨化是导致稳态低摩擦系数、磨损和界面剪应力的原因。
Friction and wear behaviors of hydrogenated fullerene-like (H-FLC) carbon films sliding against Si3N4ceramic balls were performed at different contact loads from 1 to 20 N on a reciprocating sliding tribometer in air. It was found that the films exhibited non-Amontonian friction behaviors, the coefficient of friction (COF) decreased with normal contact load increasing: the COF was ~0.112 at 1 N contact load, and deceased to ultralow value (~0.009) at 20 N load. The main mechanism responsible for low friction and wear under varying contact pressure is governed by hydrogenated carbon transfer film that formed and resided at the sliding interfaces. In addition, the unique fullerene-like structures induce well elastic property of the H-FLC films (elastic recovery 78%), which benefits the high load tolerance and induces the low wear rate in air condition. For the film with an ultralow COF of 0.009 tested under 20 N load in air, time of flight secondary ion mass spectrometry (ToF-SIMS) signals collected inside and outside the wear tracks indicated the presence of C2H3−and C2H5−fragments after tribological tests on the H-FLC films surface. We think that the tribochemistry and elastic property of the H-FLC films is responsible for the observed friction behaviors, the high load tolerance, and chemical inertness of hydrogenated carbon-containing transfer films instead of the graphitization of transfer films is responsible for the steady-state low coefficients of friction, wear, and interfacial shear stress.
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影响因子：
10.9
作者：
P. Paredez;M.E.H. Maia da Costa;L. Zagonel;C. Ribeiro;F. Alvarez
通讯作者：
P. Paredez;M.E.H. Maia da Costa;L. Zagonel;C. Ribeiro;F. Alvarez
影响因子：
4
作者：
Qi Wang;Chengbing Wang;Zhou Wang;Junyan Zhang;D. He
通讯作者：
Qi Wang;Chengbing Wang;Zhou Wang;Junyan Zhang;D. He
影响因子：
2.1
作者：
Thomas W. Scharf;I. L. Singer
通讯作者：
Thomas W. Scharf;I. L. Singer
影响因子：
5
作者：
H. Ronkainen;Simo Varjus;K. Holmberg
通讯作者：
H. Ronkainen;Simo Varjus;K. Holmberg
DOI：
10.1021/j100276a001
发表时间：
1986-02
期刊：
The Journal of Physical Chemistry
影响因子：
--
作者：
Q. Zhang;S. C. O'brien;J. Heath;Y. Liu;R. Curl;H. Kroto;R. Smalley
通讯作者：
Q. Zhang;S. C. O'brien;J. Heath;Y. Liu;R. Curl;H. Kroto;R. Smalley