Ohmic Contact-Free Mobility Measurement in Ultra-Wide Bandgap AlGaN/AlGaN Devices

Ohmic Contact-Free Mobility Measurement in Ultra-Wide Bandgap AlGaN/AlGaN Devices
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DOI:
10.1109/led.2017.2771148
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发表时间:
2018
影响因子:
4.9
通讯作者:
Peter A. Butler;W. M. Waller;M. Uren;A. Allerman;A. Armstrong;R. Kaplar;Martin Kuball
Peter A. Butler;W. M. Waller;M. Uren;A. Allerman;A. Armstrong;R. Kaplar;Martin Kuball
中科院分区:
工程技术2区
文献类型:
--
作者:
Peter A. Butler;W. M. Waller;M. Uren;A. Allerman;A. Armstrong;R. Kaplar;Martin Kuball

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我们测量了超宽带隙Al 0.85 Ga 0.15 N/Al 0.7 Ga 0.3 N异质结中载流子迁移率与电子密度的关系,只使用Au/Pt肖特基接触沉积,而不需要欧姆接触。利用这种技术,我们测量了AlGaN/AlGaN异质结在1010至1013 cm−2的二维电子气密度范围内的迁移率。在室温下,亚阈值迁移率为4 cm 2/Vs,峰值迁移率为155 cm 2/Vs。峰值迁移率随温度降低,T-0.86,表明合金散射是主要的散射机制。
We measure the electron density dependence of carrier mobility in ultra-wide bandgap Al0.85Ga0.15N/Al0.7Ga0.3N heterostructures, using only Au/Pt Schottky contact deposition and without the need for Ohmic contacts. With this technique, we measure mobility over a two-dimensional electron gas density range from 1010 to 1013 cm−2 at an AlGaN/AlGaN heterojunction. At room temperature, subthreshold mobility was 4 cm2/Vs and peak mobility 155 cm2/Vs. Peak mobility decreased with temperature as T−0.86 suggesting alloy scattering as the dominant scattering mechanism.