Microstructure developments of F-doped SiO2 thin films prepared by liquid phase deposition
Microstructure developments of F-doped SiO2 thin films prepared by liquid phase deposition
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DOI:
10.1016/j.tsf.2011.08.039
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发表时间:
2012
期刊:
影响因子:
2.1
通讯作者:
Shijun Yu;Jaesung Lee;S. Nozaki;Junghyun Cho
中科院分区:
文献类型:
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作者:
Shijun Yu;Jaesung Lee;S. Nozaki;Junghyun Cho