Nanoscale magnetic domain structures in epitaxial cobalt films
Nanoscale magnetic domain structures in epitaxial cobalt films
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DOI：
10.1103/physrevb.54.3428
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发表时间：
1996-08-01
影响因子：
3.7
通讯作者：
Bucher, JP
中科院分区：
文献类型：
--
作者：
Hehn, M;Padovani, S;Bucher, JP
我们分析了高质量分子束外延（MBE）生长的（0001）-hcp钴膜的磁畴结构，其磁畴宽度与膜厚的数量级有关，膜厚从10到500 nm不等。随着膜的厚度增加，磁化在相对大的厚度范围内从完全在平面内（10 nm）转向完全在平面外（50 nm）。在50 nm以上，磁力显微镜（MFM）的局部畴成像与overalI磁化测量一起证实了由Kittel预测的具有垂直取向的特征性多畴结构。磁畴的周期性，然后描述的根d法律（其中d是膜厚度），导致域壁能量的测定。磁泡和周期性条纹图案的出现是可视化的变场MFM。
We have analyzed the magnetic domain structure in high quality molecular beam epitaxy (MBE) grown (0001)-hcp cobalt films of thicknesses varying from 10 to 500 nm for which the magnetic domain width is of the order of the film thickness. As the thickness of the film is increased, the magnetization turns from fully in plane (10 nm) to fully out of plane (50 nm) over a relatively large thickness range. Above 50 nm, the local domain imaging by magnetic force microscopy (MFM) together with overalI magnetization measurements confirm the characteristic multidomain structure with perpendicular orientation predicted by Kittel. The periodicity of domains is then described by a root d law (where d is the film thickness) thar leads to the determination of domain wall energies. The occurrence of magnetic bubbles and periodic stripe patterns is visualized by variable field MFM.