Cathode plasma electrolytic deposition of Al2O3 coatings doped with SiC particles
Cathode plasma electrolytic deposition of Al2O3 coatings doped with SiC particles
复制标题
阴极等离子体电解沉积SiC颗粒掺杂Al2O3涂层
DOI：
10.1016/j.ceramint.2018.11.167
复制
发表时间：
2019-03
影响因子：
5.2
通讯作者：
He Yedong
中科院分区：
文献类型：
--
作者：
Liu Chenxu;Zhang Shuguang;Ji Ruonan;Wang Peng;Zhang Jin;Tian Yu;Meng Yonggang;He Yedong
采用阴极等离子体电沉积的方法，在Al(NO3)3电解液中制备了掺半导体颗粒的Al_2O_3涂层，并在电解液中分散了纳米和微米颗粒(平均粒径分别为0.5~1.7 和40 nm)。研究了碳化硅的浓度和颗粒尺寸对复合涂层组织和摩擦学性能的影响。与用碳化硅微粒分散的情况相比，纳米碳化硅颗粒在涂层中的分散更加均匀。当纳米碳化硅的浓度为5 g/L时，复合涂层的表面粗糙度比未改性涂层降低了63%。摩擦结果表明，添加5 g/L纳米碳化硅颗粒后，摩擦因数从0.6降至0.38，干摩擦磨损体积减小。测量了电流密度和槽电压，分析了碳化硅颗粒对沉积过程的影响。结果表明，碳化硅颗粒可以改变涂层在沉积过程中的电学行为，减弱等离子体的轰击，改善涂层的结构。
Semiconductor particles doped Al2O3coatings were prepared by cathode plasma electrolytic deposition in Al(NO3)3electrolyte dispersed with SiC micro- and nano-particles (average particle sizes of 0.5–1.7 µm and 40 nm respectively). The effects of the concentrations and particle sizes of the SiC on the microstructures and tribological performances of the composite coatings were studied. In comparison with the case of dispersing with SiC microparticles, the dispersion of SiC nanoparticles in the coatings was more uniform. When the concentration of SiC nanoparticles was 5 g/L, the surface roughness of the composite coating was reduced by 63%, compared with that of the unmodified coating. Friction results demonstrated that the addition of 5 g/L SiC nanoparticles reduced the friction coefficient from 0.60 to 0.38 and decreased the wear volume under dry friction. The current density and bath voltage were measured to analyze the effects of SiC particles on the deposition process. The results showed that the SiC particles could alter the electrical behavior of the coatings during the deposition process, weaken the bombardment of the plasma, and improve the structures of the coatings.
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DOI：
10.1017/cbo9780511709333
发表时间：
--
期刊：
--
影响因子：
--
作者：
J. Maxwell
通讯作者：
J. Maxwell
影响因子：
6.7
作者：
Yunlong Wang;Zhaohua Jiang;Xinrong Liu;Zhongping Yao
通讯作者：
Yunlong Wang;Zhaohua Jiang;Xinrong Liu;Zhongping Yao
影响因子：
3.2
作者：
S. Stojadinović;N. Tadic;N. Šišović;R. Vasilić
通讯作者：
S. Stojadinović;N. Tadic;N. Šišović;R. Vasilić
影响因子：
3.6
作者：
Xu Yang;Xianfei Ding;G. Hao;Yongfeng Liang;Junpin Lin
通讯作者：
Xu Yang;Xianfei Ding;G. Hao;Yongfeng Liang;Junpin Lin
影响因子：
5.4
作者：
E. Bahadori;S. Javadpour;M. H. Shariat;F. Mahzoon
通讯作者：
E. Bahadori;S. Javadpour;M. H. Shariat;F. Mahzoon