The Nanoelectronics Roadmap
The Nanoelectronics Roadmap
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DOI:
10.1002/9781118958254.ch01
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发表时间:
2014
期刊:
影响因子:
9.7
通讯作者:
J. Hutchby
中科院分区:
文献类型:
--
作者:
J. Hutchby
Aggressive scaling of CMOS devices using advanced lithographic technology (e.g., extreme ultraviolet or soft X‐rays) combined with use of new materials and processes is rapidly approaching fundamental limits to further scaling. This is based on simultaneous requirements to control the location and flow of charge while maintaining minimum energy dissipation. Anticipating these eventual limits on effective scaling of transistors, the semiconductor manufacturing industry, acting through the International Technology Roadmap for Semiconductor's (ITRS's) governing body, the International Roadmap Committee (IRC), created the Emerging Research Device (ERD) International Technical Working Group (ITWG). The IRC charged this group to identify, evaluate, and track research and development of new devices proposed to extend and/or eventually replace CMOS information processing technology. This chapter first discusses the fundamental basis for anticipating scaling limits facing charge‐based devices and then introduces the Emerging Research Device's International Technical Working Group's task. This is followed by a brief introduction of six guiding principles the ERD ITWG considers to be fundamental to successful development of new nanoelectronic information processing devices. The chapter continues with discussion of eight relevance or evaluationparameters and factors used to compare and evaluate those emerging devices chosen for tracking. The performance and evaluation factors include(i) technology scaling, (ii) speed,(iii) energy efficiency, (iv) gain (logic) or ON/OFF ratio (memory), (v) operational reliability, (vi) operational temperature, (vii) CMOS technological compatibility, and (viii) CMOS architecturalcompatibility. The chapter concludes with discussion of a few observations and perspectives, including an observation by Herb Kroemer in his Nobel Lecture on December 8, 2000: “The principal applications of any sufficiently new and innovative technology always have been ‐ and will continue to be applications created by that technology” (Quasi‐Electric Fields and Band Offsets: Teaching Electrons).