On the reaction kinetics of Ni with amorphous carbon
On the reaction kinetics of Ni with amorphous carbon
复制标题
DOI：
10.1016/j.carbon.2008.01.021
复制
发表时间：
2008-04-01
期刊：
影响因子：
10.9
通讯作者：
Anton, R.
中科院分区：
文献类型：
--
作者：
Anton, R.
利用原位透射电子显微镜研究了负载型镍粒子对非晶碳（a - C）薄膜石墨化的动力学。在350到500摄氏度的温度下，将镍粒子沉积在非晶碳薄膜上，并在600到720摄氏度下记录其与基底的反应。发现活性强烈依赖于温度。反应通常始于镍粒子被石墨壳包裹，最终金属从石墨壳中被挤出并扩散在基底上，随后基底被石墨化。测量了反应前沿的传播速度以及其长度和石墨化面积随时间的增长，并将其作为温度的函数。通过这种方法，确定了活化能为1.8 ± 0.2电子伏特；这一结果与其他作者报道的1.6电子伏特的理论估计值具有显著的可比性。（C）2008爱思唯尔有限公司。保留所有权利。
The kinetics of the graphitisation of thin films of amorphous carbon (a-C) by supported Ni particles was investigated by in situ transmission electron microscopy. Ni particles were deposited on a-C films at temperatures from 350 to 500 degrees C, and reactions with the support were recorded at 600 up to 720 degrees C. The activity was found to strongly depend on temperature. Reactions generally started with encapsulation of Ni particles with a graphite shell, out of which the metal was eventually expelled and spread on the substrate, which was then graphitised. The propagation speed of the reaction front, and the increase with time of its length and of the graphitised area were measured as function of temperature. Through this, an activation energy of 1.8 +/- 0.2 eV was determined; such result is significantly comparable to the theoretical estimate of 1.6 eV, reported by other authors. (C) 2008 Elsevier Ltd. All rights reserved.