Mechanism of diffusional transport during ion nitriding of aluminum
Mechanism of diffusional transport during ion nitriding of aluminum
复制标题
铝离子渗氮过程中的扩散传输机制
DOI：
10.1063/1.126070
复制
发表时间：
2000
影响因子：
4
通讯作者：
W. Möller
中科院分区：
文献类型：
--
作者：
T. Telbizova;S. Parascandola;U. Kreissig;R. Günzel;W. Möller
利用标记物和同位素序列技术，结合离子束分析，研究了铝低能离子氮化过程中的扩散输运机制。当离子能量为1keV，温度为40 0 °C时，氮化物生长在表面，铝由底层扩散提供。
The mechanism of diffusional transport during low-energy ion nitriding of aluminum has been investigated using marker and isotope sequence techniques in connection with ion-beam analysis. For an ion energy of 1 keV and a temperature of 400 °C, it is shown that the nitride grows at the surface with aluminum being supplied by diffusion from the underlying bulk.